LIFT AND WAFER LOADING APPARATUS HAVING THE SAME

Title:

LIFT AND WAFER LOADING APPARATUS HAVING THE SAME

Document Type and Number:

Japanese Patent JPH09186214

Kind Code:

A

Abstract:

To realize improvement in reliability by reducing the load on a lift mechanism of a lift device.

A lift device includes a lift mechanism 40 for vertically moving a carriage 11, and a cylinder unit 41B supporting the load of the carriage 11 so as to reduce the load on the lift mechanism. The cylinder unit 41B has a cylinder mechanism 41-1 and a pressure control unit 41B-1. The pressure control unit 41B-1 is so constituted as to control the pressure in a lower chamber 63a of a cylinder 63 to pressure P1 when the carriage 11 is stopped. When the lift mechanism 40 operates to raise the carriage 11, the pressure control unit 41B-1 controls the pressure to pressure P2, which is higher than the pressure P1. When the lift mechanism 40 operates to lower the carriage 11, the pressure control unit 41B-1 controls the pressure to pressure P3, which is lower than the pressure P1.

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Inventors:

TAKAHASHI WATARU

Application Number:

JP34392695A

Publication Date:

July 15, 1997

Filing Date:

December 28, 1995

Export Citation:

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Assignee:

FUJITSU LTD

International Classes:

H01L21/677; H01L21/68; (IPC1-7): H01L21/68

Attorney, Agent or Firm:

Tadahiko Ito

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