To reduce the area of an optoelectric transducer, by setting the axial direction maximum height of a projection image of a part made of a semiconductor material on a flat plane parallel to the axis, in the optoelectric transducer positioned in a space, at a specified value or more to the minimum width of the projection image on a flat plane vertical to the axis.
A shape 107 projected to a flat plane 110, which is vertical to the axis 8 of a part that exists within a space formed by a spherical semiconductor material, is made circular, and its width 109 is equivalent to the diameter of the circle of a part where the spherical semiconductor material contacts with a reflection plane 3. A shape 108 projected to a flat plane parallel to the axis 8 is a part of the circle, and the height 110 of the shape 108 in the direction of the axis 8 is varied by a position where an optoelectric transducer is arranged. In the case of arranging the optoelectric transducer in such manner, the height in the axis 8 is set to be 1/5 or more of the width 109 of the circle. Thus, the area of the optoelectric transducer is reduced and charging efficiency can be improved.
KETSUSAKO MITSUNORI
YAZAWA YOSHIAKI
MURAMATSU SHINICHI
TSUTSUI KEN
OTSUKA HIROYUKI
| JP61195232B | ||||
| JPS6287744A | 1987-04-22 |