Title:
LIGHT EXPOSING METHOD
Document Type and Number:
Japanese Patent JP2949328
Kind Code:
B2
Abstract:
PURPOSE: To easily form images of each light wavelength on the same spot in the case of detecting a positioning mark on an exposed body by using a light beam with plural wavelengths.
CONSTITUTION: In this light exposing method for detecting a reflected light through projecting lens 14, an original image pattern 16 is irradiated with a monochromatic light from a light source 44, the image of the original pattern 16 on an exposed body 10 is projected through an projecting lens 14 which is compensated in aberration for exposure, the exposed body is placed on a movable table 26, and a position aligning mark 12 formed on the exposed body 10 is irradiated with a beam of plural light wavelengths through the projecting lens 14. Relative position between the original pattern 16 and the exposed body 10 is aligned by forming individual image points, which exist on different positions on the reflected light axis in accordance with the wavelengths of the reflected light, on a selected position of the reflected light axis through compensating lenses 68, 70 which are located between the projecting lens 14 and the detectors 56, 58, thus to compensate the position of the formed image.
Inventors:
SUGYAMA HIDEJI
Application Number:
JP28705295A
Publication Date:
September 13, 1999
Filing Date:
November 06, 1995
Export Citation:
Assignee:
HITACHI SEISAKUSHO KK
International Classes:
G01B11/00; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): G03F9/00; H01L21/027
Domestic Patent References:
| JP5413329A | ||||
| JP59123231A | ||||
| JP5950518A | ||||
| JP5990929A | ||||
| JP56110234A |
Other References:
【文献】独国公開3336963(DE,A1)
Attorney, Agent or Firm:
Unuma Tatsuyuki
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