Title:
照明装置及びパターン検査装置
Document Type and Number:
Japanese Patent JP4634427
Kind Code:
B2
Abstract:
An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else.
Inventors:
Shinichi Imai
Application Number:
JP2007250589A
Publication Date:
February 16, 2011
Filing Date:
September 27, 2007
Export Citation:
Assignee:
Toshiba Corporation
NEC
NEC
International Classes:
G01N21/84; G01N21/956; G03F1/84; H01L21/027
Domestic Patent References:
| JP2007086100A | ||||
| JP5011299A | ||||
| JP2262389A |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama