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Patent Searching and Data


Title:
LIGHTING SYSTEM, ALIGNER, EXPOSING METHOD AND MANUFACTURING METHOD OF MICRODEVICE
Document Type and Number:
Japanese Patent JP2001110706
Kind Code:
A
Abstract:

To restrain change in illumination characteristic on a surface to be illuminated under a plurality of illumination conditions without complexing unnecessarily equipment itself.

In this lighting system, a light distribution changing means which forms one out of first light distribution and second light distribution different from the first light distribution on a specified position, on the basis of an illumination light from a light source means, a light introducing system for introducing an illumination light from the light distribution changing means to an object to be illuminated, and an adjustment means which is arranged in an optical path between the light source means and the object and adjusts illumination characteristic at the object, are arranged. The adjustment means is provided with a first light distribution correcting part having specified first optical characteristic for correcting first illumination characteristic which is formed on the object by the first light distribution, and a second light distribution correcting part having specified second optical characteristic for correcting second illumination characteristic which is formed on the object by the second light distribution.


Inventors:
KOMATSUDA HIDEKI
OGATA TARO
KUDO YUJI
Application Number:
JP28741199A
Publication Date:
April 20, 2001
Filing Date:
October 07, 1999
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G03F7/20; (IPC1-7): H01L21/027; G03F7/20