Title:
マイクロリソグラフィ投影露光装置のための照明システム
Document Type and Number:
Japanese Patent JP4852617
Kind Code:
B2
Abstract:
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
Inventors:
Van Clar Johannes
Siegmann Heiko
Weable Kennis
Scharn Weber Ralph
Mullman Freight
Degunter Marx
Rai Michael
Scholz Axel
Spencer Uwe
Ferkel Reinhardt
Siegmann Heiko
Weable Kennis
Scharn Weber Ralph
Mullman Freight
Degunter Marx
Rai Michael
Scholz Axel
Spencer Uwe
Ferkel Reinhardt
Application Number:
JP2008554668A
Publication Date:
January 11, 2012
Filing Date:
February 14, 2007
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B3/00; G02B19/00
Domestic Patent References:
| JP2002116379A | 2002-04-19 | |||
| JP2003090959A | 2003-03-28 | |||
| JP2007110116A | 2007-04-26 | |||
| JPH06310396A | 1994-11-04 | |||
| JPH0684759A | 1994-03-25 |
Foreign References:
| WO2005078522A2 | 2005-08-25 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda