Title:
マイクロリソグラフィ投影露光装置の照明系
Document Type and Number:
Japanese Patent JP6434473
Kind Code:
B2
Abstract:
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).
Inventors:
Marx Degunter
Vladimir Davidenko
Thomas Corb
Frank Schlezener
Stephanie hilt
Wolfgang Hijgil
Vladimir Davidenko
Thomas Corb
Frank Schlezener
Stephanie hilt
Wolfgang Hijgil
Application Number:
JP2016210859A
Publication Date:
December 05, 2018
Filing Date:
October 27, 2016
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2011108851A | ||||
| JP2011023559A | ||||
| JP2011521467A |
Foreign References:
| WO2012100791A1 | ||||
| WO2001048543A1 | ||||
| WO2002075440A1 |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura