Title:
線形化されたエネルギーの無線周波数プラズマイオン供給源、薄膜堆積装置、およびプラズマイオンビーム発生方法
Document Type and Number:
Japanese Patent JP7206286
Kind Code:
B2
Abstract:
A plasma ion source includes a plasma chamber body having at least one inlet for introducing a feed gas to an interior of the plasma chamber body. The plasma chamber body is electrically isolated from a vacuum chamber attached to the plasma chamber body. An inductive antenna in an interior of the plasma chamber body is configured to supply a source of electromagnetic energy as a function of an RF voltage supplied thereto. The plasma ion source includes an extraction grid disposed at an end of the plasma chamber body. A voltage difference between the extraction grid and plasma chamber body accelerates charged species in a plasma discharge to generate an output quasi-neutral plasma ion beam. A bias voltage applied to the plasma chamber body includes a portion of the RF voltage supplied to the antenna combined with a pulsed DC voltage.
Inventors:
Craig A Atten
Application Number:
JP2020544376A
Publication Date:
January 17, 2023
Filing Date:
November 13, 2018
Export Citation:
Assignee:
Denton Vacuum Elsie
International Classes:
H05H1/46; C23C16/44; C23C16/505; H01J27/16; H01J27/18; H01J37/32; H01L21/31
Domestic Patent References:
JP2065033A | ||||
JP2000021597A | ||||
JP63094546A | ||||
JP11323544A | ||||
JP2007324095A | ||||
JP2013069661A | ||||
JP2000516405A | ||||
JP8083586A | ||||
JP2016134519A |
Foreign References:
US20140234554 | ||||
US20170140900 | ||||
US6071372 |
Attorney, Agent or Firm:
Murayama Yasuhiko
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe
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