Title:
低屈折率膜形成用液組成物
Document Type and Number:
Japanese Patent JP6451376
Kind Code:
B2
Abstract:
This liquid composition for forming a low-refractive film is prepared by: combining a hydrolysate of a silicon alkoxide with a silica sol, said hydrolysate being generated by adding a mixture of water and nitric acid to an alcohol solution of tetramethoxysilane or tetraethoxysilane serving as a silicon alkoxide and stirring the resulting product, and said silica sol being obtained by dispersing beaded colloidal silica particles in a liquid medium; and further combining with an organic solvent of a glycol ether. Said glycol ether is a solvent having a flash point between 140-160 DEG C inclusive.
Inventors:
Hinako Reiko
Kazuhiko Yamazaki
Yonezawa Takehiro
Kazuhiko Yamazaki
Yonezawa Takehiro
Application Number:
JP2015025889A
Publication Date:
January 16, 2019
Filing Date:
February 13, 2015
Export Citation:
Assignee:
Mitsubishi Materials Corporation
International Classes:
C09D183/02; B32B7/023; B32B27/00; C08K3/36; C08K5/06; C08L83/04; C09D5/00; C09D7/61; G02B1/111
Domestic Patent References:
| JP6233136B2 | ||||
| JP2013253145A | ||||
| JP5024885A | ||||
| JP2002307596A | ||||
| JP2003246999A | ||||
| JP2008272652A |
Foreign References:
| WO2012147625A1 |
Attorney, Agent or Firm:
Masayoshi Suda
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