To prevent an Al film from dissolving and disappearing and an ITO film from blackening and discoloring due to a cell corrosion reaction between the Al film and the ITO film generated during a photoresist developing process for patterning a pixel electrode of a semitransmissive liquid crystal display device.
A photoresist pattern 15 for patterning a reflection pixel electrode 14 or a transparent pixel electrode 16 is formed. Subsequently a surface of the photoresist pattern 15 is made to turn into a projecting and recessing surface. Next a conductive film for the reflection pixel electrode 14 or the transparent pixel electrode 16 is deposited. Subsequently the photoresist pattern 15 is removed with a lift-off process and simultaneously the reflection pixel electrode 14 or the transparent pixel electrode 16 is patterned.
Yasuhisa Tanizawa
Kawai Nobuaki