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Title:
LIQUID IMMERSION IMPRINT METHOD
Document Type and Number:
Japanese Patent JP2013056440
Kind Code:
A
Abstract:

To prevent transfer precision from decreasing resulting from that a gas constituting an atmosphere during an imprint process is taken in a space in an uneven structure formed on a mold surface.

The imprint method which includes a process for heating a molding material coating a substrate surface to a molding temperature and pressing the molding material to a mold to transfer an uneven structure formed on a mold surface is provided with a process for filling a liquid having a boiling point and a fire point higher than the molding temperature of the molding material into the uneven structure formed on the mold surface to replace air in the uneven structure before the process for pressing the molding material to the mold.


Inventors:
MEIKARI HARUTAKA
HIROSHIMA HIROSHI
Application Number:
JP2011195212A
Publication Date:
March 28, 2013
Filing Date:
September 07, 2011
Export Citation:
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Assignee:
NAT INST OF ADVANCED IND SCIEN
International Classes:
B29C59/02; H01L21/027
Domestic Patent References:
JP2007212771A2007-08-23
JP2003109915A2003-04-11