Title:
Liquid management device, solution management device and etching solution management device
Document Type and Number:
Japanese Patent JP6345631
Kind Code:
B2
Inventors:
Nakagawa Toshimoto
Hiroyuki Shirai
Hiroyuki Shirai
Application Number:
JP2015118236A
Publication Date:
June 20, 2018
Filing Date:
June 11, 2015
Export Citation:
Assignee:
Hirama Rika Laboratory Co., Ltd.
International Classes:
B01D43/00; B01D9/02; C23F1/46; H01L21/306
Domestic Patent References:
| JP2012239944A | ||||
| JP2001232233A | ||||
| JP3038150U | ||||
| JP61022503U | ||||
| JP2004359989A | ||||
| JP2008289989A | ||||
| JP49070452A | ||||
| JP2004170378A | ||||
| JP2009266893A | ||||
| JP2008106326A | ||||
| JP3223475A | ||||
| JP2000096264A | ||||
| JP2013021066A | ||||
| JP2006013158A |
Foreign References:
| US5417854 |
Attorney, Agent or Firm:
Kenzo Matsuura
Shuichi Hasegawa
Shuichi Hasegawa