Title:
液処理装置および液処理方法
Document Type and Number:
Japanese Patent JP6983008
Kind Code:
B2
Abstract:
The subject of the present invention is to suppress the contamination of processing solution in the circulation pipe after starting of processing solution circulation. The present invention provides a solution processing device, which comprises: a storage tank, circulation pipe, a pump, a filter, a back pressure valve, and a controller. The storage tank is used for storing processing solution. The circulation pipe may return the processing solution delivered from the storage tank to the storage tank. The pump may enable the circulation flow of processing solution in the circulation pipe. The filter is disposed at the downstream in the circulation pipe. The back pressure valve is disposed at the downstream of the filter in the circulation pipe. The controller may control the pump and the back pressure valve. Furthermore, while starting the circulation of processing solution in the circulation pipe, the output pressure of the pump may be increased by the controller to the predetermined first pressure; after a predetermined time period, the output pressure of the pump may be increased by the controller to a second pressure greater than the first pressure to control the output pressure of the pump.
Inventors:
Teraoka
Takashi Karasuno
Fumihiro Uemura
Masatoshi Kasahara
Ikuo Sunaka
Takashi Nakazawa
Takashi Karasuno
Fumihiro Uemura
Masatoshi Kasahara
Ikuo Sunaka
Takashi Nakazawa
Application Number:
JP2017163230A
Publication Date:
December 17, 2021
Filing Date:
August 28, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304
Domestic Patent References:
| JP11009920A | ||||
| JP2016115924A | ||||
| JP2015041751A |
Attorney, Agent or Firm:
Sakai International Patent Office
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