Title:
液処理装置
Document Type and Number:
Japanese Patent JP5646528
Kind Code:
B2
Abstract:
A liquid processing apparatus includes a substrate holding unit and an elevating member provided to ascend/descend with respect to the substrate holding unit. The substrate holding unit includes a holding base, and a first engagement member and a second engagement member which are provided to be movable in the holding base, and moved between an engaging position where the member is engaged with the peripheral edge of the substrate and a releasing position where the member releases the substrate. When the first contact unit connected to the first engagement member is in contact with a first portion to be contacted, the first engagement member is located at the engaging position. When the second contact unit connected to the second engagement member is in contact with a second portion to be contacted at a lower position than the first portion, the second engagement member is located at the engaging position.
Inventors:
江 頭 浩 司
Application Number:
JP2012053459A
Publication Date:
December 24, 2014
Filing Date:
March 09, 2012
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; H01L21/027; H01L21/306
Attorney, Agent or Firm:
Katsunuma Hirohito
Hiroyuki Nagai
Katsuomi Isogai
Noted mound 聡
Junpei Okada
Woods Hideyuki
Yukihiro Hotta
Kazuya Yamashita
Hiroyuki Nagai
Katsuomi Isogai
Noted mound 聡
Junpei Okada
Woods Hideyuki
Yukihiro Hotta
Kazuya Yamashita