Title:
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2009164622
Kind Code:
A
Abstract:
To provide a lithographic apparatus, and to provide a device manufacturing method.
A liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus, and has a liquid confinement structure 12 fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered with the liquid during exposure.
Inventors:
VERHAGEN MARTINUS CORNELIS MAR
JANSEN HANS
STAVENGA MARCO KOERT
VERSPAY JACOBUS JOHANNUS L H
JANSEN HANS
STAVENGA MARCO KOERT
VERSPAY JACOBUS JOHANNUS L H
Application Number:
JP2009043678A
Publication Date:
July 23, 2009
Filing Date:
February 26, 2009
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2008504708A | 2008-02-14 | |||
| JP2005236121A | 2005-09-02 | |||
| JP2004165666A | 2004-06-10 | |||
| JP2004289128A | 2004-10-14 |
Foreign References:
| WO2006003373A2 | 2006-01-12 | |||
| WO2004086470A1 | 2004-10-07 | |||
| WO2004055803A1 | 2004-07-01 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki