To provide a lithographic apparatus capable of supplying a high refractive index liquid to a space between a final lens component and a substrate, and of reducing the distortion of the substrate.
A burl plate 20 is intended for use in immersion lithography, wherein the substrate W is arranged on the burl (or pimple) plate 20 and the plate 20 is arranged on a flat surface of a wafer table WT. The burl plate 20 has a plurality of projections 21, 24 that are referred to as "burls" or "pimples" on the top surface thereof. The burl plate 20 has a higher burl density in a peripheral portion than in a middle so that when a higher pressure differential is applied in the peripheral portion, compression of the burls in the peripheral portion is substantially identical to that in the medial portion.
| JP3174912 | PHOTORESIST SUPPLY DEVICE |
| JP5278381 | Exposure equipment and device manufacturing method |
| JPH1124287 | PATTERN FORMING METHOD |
JEROEN JOHANNES SOPHIA MARIA MERTENS
OTTENS JOOST JEROEN
| JP2001060617A | 2001-03-06 | |||
| JP2008306217A | 2008-12-18 | |||
| JPH1050810A | 1998-02-20 | |||
| JP2001060617A | 2001-03-06 |
Toshifumi Onuki
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