Title:
LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING ARTICLE
Document Type and Number:
Japanese Patent JP2015177032
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is advantageous for achieving both throughput and overlay accuracy.SOLUTION: A lithographic apparatus includes: a plurality of charged particle optical systems, each of which irradiates a substrate with charged particle beams; and a plurality of alignment sensors including the alignment sensors arranged among the plurality of charged particle optical systems. In parallel with pattern formation, a processing part generates information on at least one out of a position and a shape of a region on the substrate based on output of the plurality of alignment sensors.
Inventors:
YAMANAKA TOSHIRO
Application Number:
JP2014052428A
Publication Date:
October 05, 2015
Filing Date:
March 14, 2014
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu