Title:
LITHOGRAPHIC SYSTEM, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED BY THE METHOD
Document Type and Number:
Japanese Patent JP2002246309
Kind Code:
A
Abstract:
To provide a system and method for controlling lithographic projection system, by which focal points over the whole exposure area can be further improved.
In the lithographic projection system, a focal surface is adjusted by using a manipulator which can be used by a projection lens system, so that the shape of the surface matches that of the surface of a wafer in the exposure area, as much as possible. The form control of the focal surface can be integrated with leveling control which decides the height and inclination of the surface of the wafer.
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Inventors:
BOONMAN MARCUS EMILE JOANNES
MULKENS JOHANNES CATHARINUS HU
BUTLER HANS
MULKENS JOHANNES CATHARINUS HU
BUTLER HANS
Application Number:
JP2002029340A
Publication Date:
August 30, 2002
Filing Date:
February 06, 2002
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
G03F7/22; G03F7/20; G03F7/207; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/22; G03F9/00
Attorney, Agent or Firm:
Akira Asamura (3 outside)
Previous Patent: OPTICAL CONDENSER SYSTEM, OPTICAL ILLUMINATION SYSTEM PROVIDED WITH THE SAME, AND EXPOSURE SYSTEM
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