リソグラフィ処理セルの制御方法、デバイス製造方法、リソグラフィ装置、トラックユニット、リソグラフィ処理セル、およびコンピュータプログラム

Title:

Document Type and Number:

Japanese Patent JP4450752

Kind Code:

B2

Abstract:

A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.

Inventors:

Norbertus josephus martinus van den nieuveral
Johannes On Free
Roel Bowmen

Application Number:

JP2005078033A

Publication Date:

April 14, 2010

Filing Date:

February 18, 2005

Export Citation:

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