Title:
LITHOGRAPHY DEVICE, METHOD OF MANUFACTURING DEVICE AND DEVICE MANUFACTURED BY THE SAME
Document Type and Number:
Japanese Patent JP2002196242
Kind Code:
A
Abstract:
To provide an improved projection system for EUV radiation and a method of designing the same.
A classification method for an n mirror system to classify the systems of the mirrors by a figure C is defined like equation (1). In the equation, ai=1 when the incident angle of a main ray of the mirror i is negative and ai=0 when the incident angle of the main ray of the mirror i is positive; M is the magnifying power of the projection system and further an index i successively imparts numbers to the mirrors of the systems. Three kinds of the 4-mirror system, 14 kinds of the 6-mirror systems and 154 kinds of the 8-mirror systems are useful in the EUV lithography projection system.
Inventors:
BAL MATTHIEU FREDERIC
BOCIORT FLORIAN
BRAAT JOSEPHUS JOHANNES MARIA
BOCIORT FLORIAN
BRAAT JOSEPHUS JOHANNES MARIA
Application Number:
JP2001339576A
Publication Date:
July 12, 2002
Filing Date:
November 05, 2001
Export Citation:
Assignee:
ASM LITHOGRAPHY BV
International Classes:
G02B17/00; G02B13/14; G02B13/22; G02B17/06; G03F7/20; H01L21/027; (IPC1-7): G02B17/00; G02B13/14; G02B13/22; G03F7/20; H01L21/027
Domestic Patent References:
| JP2000100703A | 2000-04-07 | |||
| JPH03103809A | 1991-04-30 | |||
| JP2000235144A | 2000-08-29 | |||
| JPH09211332A | 1997-08-15 | |||
| JP2000100694A | 2000-04-07 | |||
| JP2002015979A | 2002-01-18 | |||
| JPH1090602A | 1998-04-10 | |||
| JP2002116382A | 2002-04-19 | |||
| JP2002139672A | 2002-05-17 | |||
| JP2000098231A | 2000-04-07 | |||
| JPH09251097A | 1997-09-22 | |||
| JP2000098228A | 2000-04-07 |
Attorney, Agent or Firm:
Akira Asamura (3 outside)