LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURING METHOD

Title:

LITHOGRAPHY EQUIPMENT AND DEVICE MANUFACTURING METHOD

Document Type and Number:

Japanese Patent JP2004006823

Kind Code:

A

Abstract:

To provide an improved displacement measuring system to be used in a lithography projector.

This displacement measuring system for measuring the position of an optical element in the projection system of a lithography projector utilizes a first grating mounted on the optical element and an interference measuring principle accompanied with the use of a second grating mounted on a reference frame.

Inventors:

RAVENSBERGEN MARIUS

Application Number:

JP2003113458A

Publication Date:

January 08, 2004

Filing Date:

March 13, 2003

Export Citation:

Click for automatic bibliography generation Help

Assignee:

ASML NETHERLANDS BV

International Classes:

G01D5/38; G02B5/18; G03F7/20; G03F9/00; G01B11/00; H01L21/027; (IPC1-7): H01L21/027; G01B11/00; G02B5/18; G03F9/00

Attorney, Agent or Firm:

Hideto Asamura
Hajime Asamura
Toru Mori
Yukio Iwamoto

Previous Patent: METHOD FOR OBTAINING AND USING POROGENS, POROGENS-INTEGRATED PRECURSOR AND POROUS ORGANIC SILICA GLA...

Next Patent: PACKAGE FOR OPTICAL SEMICONDUCTOR AND ITS MANUFACTURING METHOD