Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4667290
Kind Code:
B2
Abstract:
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid (500) between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor (228) includes an array of outlets (224) configured to minimize vibrations.
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Inventors:
Marcel Beckers
Schult Nicolas Rambertus Dondels
Christian alexander hogendam
Johannes Henrix Wilhelms Jacobs
Nicolas Ten Cate
Nicolas Rudolph Kemper
Ferdi Migchel Brink
Elmer Evers
Schult Nicolas Rambertus Dondels
Christian alexander hogendam
Johannes Henrix Wilhelms Jacobs
Nicolas Ten Cate
Nicolas Rudolph Kemper
Ferdi Migchel Brink
Elmer Evers
Application Number:
JP2006102872A
Publication Date:
April 06, 2011
Filing Date:
April 04, 2006
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2005012228A | ||||
| JP6124873A | ||||
| JP2005057278A |
Attorney, Agent or Firm:
Sakaki Morishita