Title:
リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
Document Type and Number:
Japanese Patent JP7415311
Kind Code:
B2
Abstract:
A film forming material for lithography comprising a maleimide resin represented by the following formula (1A)
Inventors:
Kouichi Yamada
Noriko Horiuchi
Takashi Makinoshima
Masatoshi Echigo
Noriko Horiuchi
Takashi Makinoshima
Masatoshi Echigo
Application Number:
JP2020557610A
Publication Date:
January 17, 2024
Filing Date:
November 21, 2019
Export Citation:
Assignee:
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
G03F7/11; C08G12/08; G03F7/20; G03F7/26
Domestic Patent References:
| JP2010085673A | ||||
| JP2015176067A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Kazuhiko Naito
Toshifumi Onuki
Kazuhiko Naito