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Title:
リソグラフィー用材料及びその製造方法、リソグラフィー用組成物、パターン形成方法、並びに、化合物、樹脂、及びこれらの精製方法
Document Type and Number:
Japanese Patent JP6883291
Kind Code:
B2
Abstract:
A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin.

Inventors:
Hiroto Kudo
Echigo Masatoshi
Takumi Hida
Takashi Sato
Application Number:
JP2017536445A
Publication Date:
June 09, 2021
Filing Date:
August 23, 2016
Export Citation:
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Assignee:
Kansai University
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
G03F7/039; C08G79/14; G03F7/038; G03F7/20
Domestic Patent References:
JP52019516A
JP2005071488A
JP64082040A
JP2015117271A
JP2005344009A
JP2005128049A
JP2008308691A
JP10063002A
JP57082238A
JP2008163242A
JP2007526496A
Foreign References:
WO2016035560A1
Other References:
XU, Huaping,Dendritic tellurides acting as antioxidants,Chinese Science Bulletin,中国,2006年,Vol. 51 No.19,2315-2321
SUZUKI, Hitomi,Novel Aromatic Azopolymers with Regularly InterposedTellurium Atoms in the Backbone,Chemische Berichte,ドイツ,1995年,128,703-709
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Kazuhiko Naito