Title:
LITHOGRAPHY PROJECTION SYSTEM
Document Type and Number:
Japanese Patent JP3771414
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain an arch-like or ring-like irradiation beam by providing a scattering device, which checks diffusion of irradiation beam to a projection system with which the pattern image of a mask in a lithography projection system is irradiated on a substrate and forming a fan-like curved line by reflecting a fine collimated incident beam.
SOLUTION: In a lithography projection system, for example, for ultraviolet light of wavelength of 13 nm is generated by an undulater 10 of an electron storage ring. The reflection light is collected by a first repeapting mirror 13, and the image of a constriction part of a light source is formed in an intermediate plane. In the intermediate plane, a first scattering mirror 14 is provided and increases the diffusion of irradiated light beam inside at least one plane. A second repeating mirror 15 forms the image of a first scattering mirror image on an incident pupil 18 in a projection system of a lithography system. A second scattering mirror 16 folds the projection beam and sends it onto a mask 17 and further increases the diffusion of reflected light beam. The second scattering mirror can be combined with the second repeating mirror.
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Inventors:
Volgart Kluisinga
Isabelle Elkdello Zants
Isabelle Elkdello Zants
Application Number:
JP2000065234A
Publication Date:
April 26, 2006
Filing Date:
March 09, 2000
Export Citation:
Assignee:
IS M Lithography Besloten Fuennaught Shap
International Classes:
G02B5/02; H01L21/027; G02B5/08; G02B19/00; G03F7/20; (IPC1-7): H01L21/027; G02B5/02; G02B5/08; G02B19/00; G03F7/20
Domestic Patent References:
| JP10070058A | ||||
| JP8148415A | ||||
| JP7260998A | ||||
| JP7235471A | ||||
| JP7094397A | ||||
| JP7084108A | ||||
| JP6333798A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukio Iwamoto
Toru Mori
Hajime Asamura
Yukio Iwamoto
Toru Mori