LITHOGRAPHY SYSTEM, METHOD OF CLAMPING AND WAFER TABLE

Title:

LITHOGRAPHY SYSTEM, METHOD OF CLAMPING AND WAFER TABLE

Document Type and Number:

Japanese Patent JP2014039048

Kind Code:

A

Abstract:

To provide a lithography system for projecting an image or an image pattern on a target such as a wafer.

A target is included in the system by means of a target table 2, and a clamping means is present for clamping the target on the table. The clamping means includes a layer of a stationary liquid 3 included at such a predetermined thickness between the target and the target table that a pressure drop Pcap arises by the material of the liquid and the material of the respective contacting faces A, B of the target 1 and the target table 2 between the target and the target table.

Inventors:

GUIDO DE BOER
DANSBERG MICHEL PIETER
KRUIT PIETER

Application Number:

JP2013193589A

Publication Date:

February 27, 2014

Filing Date:

September 18, 2013

Export Citation:

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