Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
LOW-TEMPERATURE PLASMA TREATING DEVICE
Document Type and Number:
Japanese Patent JPH05287664
Kind Code:
A
Abstract:

PURPOSE: To provide a low-cost and simple low-temperature plasma device capable of filling the whole space between a pair of electrode plates with a gas without installing an exhaust duct, a cover for preventing the gas from scattering, etc.

CONSTITUTION: In a low-temperature plasma device, a pair of electrode plates 8 and 9 comprise metallic plates separately arranged so as to sandwich a moving material to be treated in between the plates in a reactor capable of being kept in vacuum and continuously moving the material to be treated. A gas induction pipe 1 is set at an inlet of one end of the electrodes and a mechanism for supplying a gas to a space between the electrodes is installed.


Inventors:
IKURO TOSHIHIRO
YAMAMOTO ATSUSHI
Application Number:
JP11544092A
Publication Date:
November 02, 1993
Filing Date:
April 07, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KANEBO LTD
International Classes:
D06B19/00; H05H1/46; (IPC1-7): D06B19/00; H05H1/46