Title:
ＭＥＭＳ素子およびその製造方法
Document Type and Number:
Japanese Patent JP6863545
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a MEMS element of which breakage is prevented, and a method for manufacturing said MEMS element.SOLUTION: The MEMS element is provided in which an air gap is formed by arranging a silicon substrate 1 comprising a back chamber 11, and a stationery electrode 8 and a movable electrode 6 on the silicon substrate with a first spacer 12 interposed therebetween. The MEMS element comprises: a second spacer 13 between the silicon substrate and the movable electrode; and a step part between a side surface end 14 of the back chamber and the second spacer. The step part becomes a smooth shape by removing a thermal oxide film 2 formed on a part of the silicon substrate, no projection is formed on the second spacer, so that breakage of the movable electrode is prevented.SELECTED DRAWING: Figure 2
Inventors:
Takahide Usui
Shinichi Araki
Shinichi Araki
Application Number:
JP2017012679A
Publication Date:
April 21, 2021
Filing Date:
January 27, 2017
Export Citation:
Assignee:
New Japan Radio Co., Ltd.
International Classes:
B81B3/00; B81C1/00; H04R19/04; H04R31/00
Domestic Patent References:
| JP2008244752A | ||||
| JP2016002625A | ||||
| JP2016022544A |