To provide a method for industrially easily producing in high yield and in high purity a t-butoxycarbonyl-substituted norbornene derivative of the general formula (2) useful as a raw material for resins for resists suitable for exposure to vacuum ultraviolet radiation from an ArF laser or the like.

This method for producing a t-butoxycarbonyl-substituted norbornene derivative of the general formula (2) (wherein, R is H or methyl; and n is an integer of 0 or 1) comprises transesterification between a methoxycarbonyl-substituted norbornene derivative of the general formula (1) and a t-butoxy alkali salt in a solvent in the presence of a synthetic zeolite.