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Patent Searching and Data


Title:
MAGNETIC FIELD GENERATOR FOR PLANAR-MAGNETRON SPUTTERING SYSTEM
Document Type and Number:
Japanese Patent JPH04116162
Kind Code:
A
Abstract:

PURPOSE: To uniformize the erosion shape of a target plate over the shallow and wide area in the magnetic field generator for a planar-magnetron sputtering system by arranging an electromagnet for an auxiliary magnetic field between the center magnetic pole constituting the core of an electromagnet for a main magnetic filed and the peripheral magnetic pole.

CONSTITUTION: An electromagnet 4 for an auxiliary magnetic field having a magnetic circuit by the core separated from both magnetic poles is arranged between the center magnetic pole 2a constituting the core 2 of an electromagnet 1 for a main magnetic filed and the peripheral magnetic pole 2b in this magnetic field generator, hence the component of the magnetic field generated by the electromagnet 4 perpendicular to the target plate TP is efficiently and easily increased or decreased by changing the current to be applied to the exciting coil 6 of the electromagnet 4, and the position, where the magnetic field formed on the target plate by the synthesis of the electromagnets 1 and 4 is made parallel to the target plate, is widely moved in the radial direction of the target plate, and the target is uniformly eroded.


Inventors:
ONISHI YOSHIHIKO
MATSUMURA HITOMI
NISHIDA HIROSHI
HAYASHI HIDETAKA
Application Number:
JP23649490A
Publication Date:
April 16, 1992
Filing Date:
September 05, 1990
Export Citation:
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Assignee:
KOBE STEEL LTD
International Classes:
C23C14/35; (IPC1-7): C23C14/35
Attorney, Agent or Firm:
Akeda Kan