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Title:
非均一な磁界を有する磁気励起プラズマチャンバ
Document Type and Number:
Japanese Patent JP4932811
Kind Code:
B2
Abstract:
A plasma chamber having a magnet which produces a magnetic field such that, within a region parallel to and adjacent to the workpiece, the direction of the magnetic field is approximately the vector cross product of (1) the gradient of the magnitude of the magnetic field, and (2) a vector extending perpendicularly from the workpiece surface toward the plasma. Alternatively, the plasma chamber includes a north magnetic pole and a south magnetic pole located at distinct azimuths around the periphery of the workpiece. The azimuth of the south magnetic pole relative to the north magnetic pole is clockwise around the central axis, and each magnetic pole faces a direction which is more toward than away from a central axis of the workpiece area. An additional aspect of the invention is a plasma chamber having a rotating magnetic field produced by electromagnets spaced around the periphery of the workpiece which receive successive fixed amounts of electrical current during successive time intervals. During each transition between the time intervals, the current supplied to each electromagnet is changed relatively slowly or relatively quickly according to whether the current change includes a change in polarity.

Inventors:
Hong Ching Shan
Roger Lindley
Claes Björkman
Shu Yu-chan
Richard Plavidal
Brian pump
Jiding
Zonguri
Kuan-Hanki
Michael welch
Application Number:
JP2008272473A
Publication Date:
May 16, 2012
Filing Date:
October 22, 2008
Export Citation:
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Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/3065; H05H1/46; C23C16/505; H01J37/32; H01L21/00; H01L21/02; H01L21/203; H01L21/205; H01L21/302; H01L21/687
Domestic Patent References:
JP8115905A
JP8217594A
JP7153598A
JP62205270A
Attorney, Agent or Firm:
Yoshiaki Anzai



 
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