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Patent Searching and Data


Title:
MAGNETRON SPUTTERING DEVICE FOR FERROMAGNETIC BODY
Document Type and Number:
Japanese Patent JPH04325675
Kind Code:
A
Abstract:

PURPOSE: To provide a magnetron sputtering device in which a magnetic field on a target made of a ferromagnetic body can be increased and the production of the target is facilitated.

CONSTITUTION: A target 18 made of a ferromagnetic body is put on one side of a backing plate 12 so that the target 18 confronts a substrate and a magnetic field generator 14 is placed on the other side of the backing plate 12. In a magnetron sputtering device in which a magnetic field orthogonal to an electric field is formed between the target 18 and the substrate with the magnetic field generator 14, the target 18 is produced by joining plural members 20-23 having dividing faces in a direction perpendicular to the magnetic field.


Inventors:
MIYAJIMA SHIN
Application Number:
JP12228291A
Publication Date:
November 16, 1992
Filing Date:
April 24, 1991
Export Citation:
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Assignee:
VICTOR COMPANY OF JAPAN
International Classes:
C23C14/35; (IPC1-7): C23C14/35
Attorney, Agent or Firm:
Yoichiro Shimoda (1 person outside)