Title:
MAGNETRON SPUTTERING SYSTEM, AND METHOD OF MANUFACTURING THIN FILM
Document Type and Number:
Japanese Patent JP2009256747
Kind Code:
A
Abstract:
To improve the single crystallinity in a wide area domain direction of an LaB6 thin film obtained in the case of depositing the LaB6 thin film by sputtering.
The high-frequency component electric power, from which the low-frequency component from a high-frequency power supply 193 is cut, and DC electric power are applied to the target 11, and the DC electric power from the other DC electric power supply 221 is applied to a substrate holder 13 during the application of the high-frequency electric power and the DC electric power.
Inventors:
NAKAMURA NOBORU
Application Number:
JP2008109080A
Publication Date:
November 05, 2009
Filing Date:
April 18, 2008
Export Citation:
Assignee:
CANON ANELVA CORP
International Classes:
C23C14/44; C23C14/34; C23C14/58
Domestic Patent References:
| JPS6235512A | 1987-02-16 | |||
| JP2006523015A | 2006-10-05 | |||
| JP2002222799A | 2002-08-09 | |||
| JPH05175149A | 1993-07-13 | |||
| JP2007186772A | 2007-07-26 | |||
| JPH06177039A | 1994-06-24 | |||
| JPH03101033A | 1991-04-25 | |||
| JPH01286228A | 1989-11-17 | |||
| JPH03232959A | 1991-10-16 | |||
| JPH11158620A | 1999-06-15 | |||
| JP2001192824A | 2001-07-17 | |||
| JP2004214487A | 2004-07-29 | |||
| JP2002056773A | 2002-02-22 |
Attorney, Agent or Firm:
Keisuke Watanabe
Yoshihiro Yamaguchi
Yoshihiro Yamaguchi