MALEIMIDE-BASED POLYMER AND COMPOSITION FOR RESIST

Title:

MALEIMIDE-BASED POLYMER AND COMPOSITION FOR RESIST

Document Type and Number:

Japanese Patent JP2002179744

Kind Code:

A

Abstract:

To obtain a maleimide-based polymer useful as a resin for a photoresist having excellent dry-etching resistance.

This maleimide-based polymer comprises at least a unit expressed by the formula (1) (where ring Z denotes a polycyclic hydrocarbon which may have substituent(s); X denotes an alkylene group; and n is 0 or 1), in which Z may be a cross-linked type hydrocarbon ring which may have substituent(s) and at least a ring among hydrocarbon rings constituting the cross-linked hydrocarbon rings may be a ring forming a lactone ring. The maleimide-based polymer is useful to be used as a resist composition in combination with a photo-acid generator.

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Inventors:

HORAI AKIRA
FUNAKI KATSUNORI

Application Number:

JP2000378769A

Publication Date:

June 26, 2002

Filing Date:

December 13, 2000

Export Citation:

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Assignee:

DAICEL CHEM

International Classes:

G03F7/033; C08F22/40; C08F220/06; C08F220/18; C08F220/26; C08F222/06; C08F222/10; C08F232/00; C08K5/00; C08L33/02; C08L33/04; C08L35/00; C08L45/00; G03F7/039; (IPC1-7): C08F232/00; C08F22/40; C08F220/06; C08F220/18; C08F220/26; C08F222/06; C08F222/10; C08K5/00; C08L33/02; C08L33/04; C08L35/00; C08L45/00; G03F7/033; G03F7/039

Attorney, Agent or Firm:

Mitsuo Hokita

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