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Title:
MANUFACTURE OF COMPOUND OXIDE SUPERCONDUCTOR THIN FILM
Document Type and Number:
Japanese Patent JPH01264114
Kind Code:
A
Abstract:

PURPOSE: To obtain a compound oxide superconductor thin film having a high superconduction critical temperature and a uniform composition by carrying out physical vacuum evaporation while radiating an oxygen ion beam to a base to a base plate where evaporated particles accumulate.

CONSTITUTION: An equipment in used mainly comprises a chamber 1 and a vacuum evaporation source 2 arranged in the chamber 1, an electron gun 3 to add induction heating to the vacuum evaporation source 2 and a base plate 5 installed opposite to the vacuum evaporation source 2 to form a thin film on its surface. By making compound oxide the vacuum evaporation source 2 and carrying out physical vacuum evaporation while radiating an oxygen ion beam, a compound oxide superconductor thin film is made. But preferably, the radiation of the oxygen ion beam is carried out preferably by changing the intensity of the beam. A thin film made of a compound oxide superconductive material having a uniform composition and organization with a high critical temperature can be obtained by the process.


Inventors:
FUJITA NOBUHIKO
ITOZAKI HIDEO
TANAKA SABURO
YATSU SHUJI
JODAI TETSUJI
Application Number:
JP12938688A
Publication Date:
October 20, 1989
Filing Date:
May 26, 1988
Export Citation:
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Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
H01L39/24; C01B13/14; C01G1/00; C01G3/00; C01G29/00; C04B41/87; C23C14/08; C23C14/24; C30B29/22; H01B12/06; H01B13/00; (IPC1-7): C01B13/14; C01G3/00; C01G29/00; C04B41/87; C23C14/08; C23C14/24; C30B29/22; H01B13/00; H01L39/24
Domestic Patent References:
JPS63224112A1988-09-19
Attorney, Agent or Firm:
Takashi Koshiba