PURPOSE: To make a magnetic thin film by sputtering targets on a substrate facing a target space on the side by providing a pair of targets facing in parallel as cathodes and by forming electrodes repelling electrons and a magnetic field perpendicular to the target surface near the targets.
CONSTITUTION: A pair of parallel targets T with the longer sides facing a substrate S are provided inside a vacuum tank 10. An auxiliary magnetic field generating means 120 (core 121, permanent magnet 122) is arranged around the targets T. An electron reflecting electrode 110 having negative potential is provided in front of the targets T. The targets T are mounted on a holder 101 while being mounted on a cooling plate 103 having a groove 103a with a bolt 104 through an insulating block 102. An earthed ring-shaped anode 130 is arranged in front of the reflecting electrode 110 and an electrode 130 is arranged so as to adjust a catch of γ electrons at the time of sputtering, while the erosion of the targets T and the film thickness distribution in the width direction of the substrate S are adjusted so as to form a magnetic thin film on the substrate.
| JP2015209580 | FILM FORMING METHOD |
| WO/2017/212879 | AL ALLOY SPUTTERING TARGET |
| JPH06158296 | DIFFUSION-BONDED SPUTTERING TARGET ASSEMBLY AND ITS PRODUCTION |
HONJO KAZUHIKO
KUSUHARA AKIO
| JPH0575827A | 1993-03-26 |
Next Patent: FORMATION OF MAGNETIC FILM LAYER