PURPOSE: To simply obtain a coating film having a flat and uniform surface without any pinholes by using a substance produced by reaction of titanic alkoxide on carboxylic acid and alcohol on the occasion that an oxidized titanic film is formed on a substrate of semiconductor, glass, ceramic or the like.
CONSTITUTION: The substrate produced by the reaction of titanic alkoxide on carboxylic acid and alcohol, which is expressed by a general formula R1mTi(OR2)4- m(where R1 and R2 are alkyl and allyl respectively), is applied on to a substrate of silicon, germanium, glass, ceramic or the like by a rotating spinner and baked for one hour at the temperature of 500°C, whereby the continuous layer of the oxidized titanic coating film. In this case, titanic tetramethoxide, titanic tetraethoxide or the like is used as the titanic alkoxide, while glacial acetic acid, acetic anhydride or the like is used as the carboxylic acid, and methyl alcohol, ethyl alcohol or the like is used as the alcohol. By this method, the coating 0.05W1μm thick is obtained, and the surface can be made smooth even when there is unevenness on the substrate.
NAKAYAMA MUNEO
HASHIMOTO AKIRA
NISHIMURA TOSHIHIRO
| JPS5314699A | 1978-02-09 | |||
| JPS55167130A | 1980-12-26 |