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Patent Searching and Data


Title:
MANUFACTURE OF MICROSTRUCTURE
Document Type and Number:
Japanese Patent JPH11293486
Kind Code:
A
Abstract:

To decrease the variations in mechanical characteristics and to suppress the deterioration of mechanical strengths with lapse of time.

A spacer layer 13 is formed on a substrate 11 formed with an electrode 12 on its surface and further, a latent image layer 18 is formed thereon. An aperture 15 is formed in the spacer layer 13 in a position adjacent to the latent image layer 18 to expose the electrode 12. Electroplating is thereafter executed with the electrode 12 as a cathode to form a plating layer 17 within the aperture 15 and on the latent image layer 18. Finally, the spacer layer 13 is removed and a cantilever 10a supported via a supporting strut 10b is manufactured on the substrate 11.


Inventors:
YAGI TAKAYUKI
Application Number:
JP10629598A
Publication Date:
October 26, 1999
Filing Date:
April 16, 1998
Export Citation:
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Assignee:
CANON KK
International Classes:
G01B21/30; B81C1/00; C23F4/00; C25D1/00; G01N37/00; G01Q60/38; G01Q70/16; H02N1/00; (IPC1-7): C25D1/00; C23F4/00; G01B21/30; G01N37/00; H02N1/00
Attorney, Agent or Firm:
Tadashi Wakabayashi (4 others)