Title:
MANUFACTURE OF MOISTURE SENSITIVE ELEMENT
Document Type and Number:
Japanese Patent JPH06118048
Kind Code:
A
Abstract:
PURPOSE: To form a pure molded moisture sensitive film having no contamination or deterioration of the moisture sensitive film and mold this moisture sensitive film with good productivity in a simple process.
CONSTITUTION: A polymer resin thin film formed on a base 11 is thermally treated to form a moisture sensitive film 12, and the moisture sensitive film 14 in an electrode terminal forming area on the base 11 is patterned by dry etching by use of a light permeable mask. The etching end part 13a of the moisture sensitive film 13 is formed with a smooth surface curvature.
Inventors:
HAYASHI TOMOHITO
KUROIWA TAKAO
KUROIWA TAKAO
Application Number:
JP29395592A
Publication Date:
April 28, 1994
Filing Date:
October 08, 1992
Export Citation:
Assignee:
YAMATAKE HONEYWELL CO LTD
International Classes:
G01N27/22; (IPC1-7): G01N27/22
Attorney, Agent or Firm:
Masaki Yamakawa