PURPOSE: To form a projected section side face of a micro-recessed and projected pattern into a desired uniform tapered shape by selecting the heat treatment condition in the resist heat treatment process.
CONSTITUTION: A resist film 3 is formed on the main surface of a quartz glass base 1 on which a chrome film 2 is formed. Said resist film 3 is heat treated, exposed to light and developed, and etching is applied to manufacture a molding tool for molding micro-recessed and projected pattern. The resist heat treatment process adopted is a simple method in which the heat treatment condition, for example, such as prebaking or postbaking is applied. At least the shape of a part of a side face 2b of a projected section 2a of the micro-recessed and projected pattern forms a tangent line at an optional site of said side face 2b. The plane or the curved face shape is formed in a manner that the angle θof the tangent line including the normal passing said contact and being included in the plane vertical to the base main surface forms a sharp angle to the base main surface.
KANAI SHOJI
NAITO SUKEFUMI
TANABE MASARU
