Title:
MANUFACTURE OF PARALLEL HYPERFINE PATTERNS
Document Type and Number:
Japanese Patent JP3421673
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for batch manufacture of hyperfine patterns of an arbitrary shape, arranged periodically in a two-dimensional manner on the surface of a substrate with adequate accuracy.
SOLUTION: This method for manufacturing hyperfine patterns in parallel comprises the steps of having the surface of a substrate 7 irradiated with anyone of coherent radiant ray, laser beam or coherent electron beam, while individually modulating the phases from a plurality of directions, and simultaneously having the surface of the substrate 7 irradiated with raw material molecules or atoms, while moving in parallel two-dimensional interference images formed on the surface of the substrate 7 and drawing hyperfine patterns. Thus, a material obtained by reacting the molecules or atoms is selectively deposited at the position of an ultrafine pattern.
Inventors:
Mei Nishi Yasu
Shigeru Imai
Shigeru Imai
Application Number:
JP15290498A
Publication Date:
June 30, 2003
Filing Date:
June 02, 1998
Export Citation:
Assignee:
School corporation Ritsumeikan
International Classes:
G03F7/26; H01L21/027; H01L21/28; H01L21/302; (IPC1-7): H01L21/027; G03F7/26; H01L21/28; H01L21/302
Domestic Patent References:
| JP3204922A | ||||
| JP6300909A | ||||
| JP536654A |
Attorney, Agent or Firm:
Mitsuhiko Watanabe