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Patent Searching and Data


Title:
MANUFACTURE OF PHOTOELECTRIC TRANSDUCER
Document Type and Number:
Japanese Patent JPS5890771
Kind Code:
A
Abstract:

PURPOSE: To contrive the improvement of sensitivity characteristic and frequency response speed, by using CdTe with Cd in excess of a stoiichiometry as an evaporation source when forming a SdTe film of a photo diode.

CONSTITUTION: After depositing a clear electrode 2 on a glass substrate 1, CdS films 3, 4 are formed by using a CdS evaporation source, and thereafter a CdTe film 5 is formed by using the CdTe with Cd in excess. Next, Te films 6, 7 are formed by using a Te evaporation source, and finally In-Sn alloy films 8, 9 are evaporated by using an In-Sn evaporation source. As a result, a photo diode is formed between films 3 and 8, and a photo diode is formed between films 4 and 7. In a photoelectric transducer manufactured in this manner, by using the CdTe evaporation source with Cd in excess as the CdTe evaporation source, the short- circuit current becomes large, and accordingly the sensitivity characteristic and frequency response speed can be improved.


Inventors:
KOSEKI HIDEO
DOBASHI NOBUHIRO
NAKAYAMA NOBUO
Application Number:
JP18973481A
Publication Date:
May 30, 1983
Filing Date:
November 25, 1981
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
H01L27/146; H01L31/0264; H01L31/18; (IPC1-7): H01L27/14; H01L31/08
Attorney, Agent or Firm:
Toshio Nakao