Title:
MANUFACTURE OF RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3436045
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To enhance precision in feeding a novolak resin and a quinonediazido derivative photosensitive agent to prepare the resist composition and to elevate the dimensional precision of the resist pattern to be obtained from this composition.
SOLUTION: The photoresist composition is manufactured by preparing the organic solvent solution of the quinonediazido derivative photosensitive agent and mixing it with the novolak resin. An alkali-soluble low molecular weight phenol resin may be added to this composition and it is preferred to add to it in the form of an organic solvent solution and it is preferred to add the novolak resin in the form of an organic solvent solution.
Inventors:
Shindome
Koji Ichikawa
Koji Ichikawa
Application Number:
JP3414497A
Publication Date:
August 11, 2003
Filing Date:
February 18, 1997
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; B01F3/08; G03F7/022; G03F7/023; H01L21/027; (IPC1-7): G03F7/022; H01L21/027
Domestic Patent References:
| JP2154259A | ||||
| JP6258825A |
Attorney, Agent or Firm:
Takashi Kuboyama
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