Title:
MANUFACTURE FOR SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5366375
Kind Code:
A
Abstract:
PURPOSE:To leave the photo resist film in matching with the exposing pattern and to form accurate pattern, by making plasma incineration and by incinerating the part not exposed first than the exposed part after exposing with a given pattern to the photo resist film.
Inventors:
TAKADA CHIYUUICHI
Application Number:
JP14247176A
Publication Date:
June 13, 1978
Filing Date:
November 26, 1976
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H05K3/06; G03F7/00; G03F7/30; G03F7/36; H01L21/027; H01L21/302; H01L21/3065; H01L21/312; (IPC1-7): G03F7/00; H01L21/312; H05K3/06