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Title:
MANUFACTURE OF SEMICONDUCTOR LASER
Document Type and Number:
Japanese Patent JP2000031600
Kind Code:
A
Abstract:

To provide a manufacturing method for a semiconductor laser which has a good high-temperature operating characteristic and whose laser characteristic is stable with the passage of time, by a method wherein the deactivation due to hydrogen of p-type impurities is prevented and a p-carrier concentration is made high.

When an AlGaInP-based visible semiconductor laser is manufactured, an atmosphere gas is changed over to a gas not containing nitrogen gas or the like from hydrogen gas + a hydrogenation group V gas in a temperature lowering process after a crystal growth operation. Therefore, it is possible to prevent hydrogen from being taken into a p-type semiconductor crystal, or it is possible to prevent that hydrogen which is already taken into is desorbed from a semiconductor. As a result, a high p-carrier concentration is obtained, a good high-temperature operating characteristic is realized, and a laser characteristic which is stable with the passage of time can be realized.


Inventors:
FUJII HIROAKI
ENDO KENJI
Application Number:
JP19907098A
Publication Date:
January 28, 2000
Filing Date:
July 14, 1998
Export Citation:
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Assignee:
NEC CORP
International Classes:
C30B25/02; H01L21/205; H01L33/06; H01L33/12; H01L33/14; H01L33/30; H01S5/00; H01S5/323; H01S5/343; H01S5/223; (IPC1-7): H01S5/30; H01L21/205; H01L33/00
Attorney, Agent or Firm:
Yosuke Goto (1 person outside)