PURPOSE: To form a master stamper having high transfer rate, by removing a resist in the part other than the region of pregrouped pattern formed on a glass substrate and by sputtering an Ni-Cr alloy to a specific thickness so as to form a dry releasing film.

CONSTITUTION: A resist film 2 is formed on a glass starting sheet 1, which is subjected to soft baking to undergo information recording. Then, a black light-shielding mask 3 is provided to the surface of the resist to undergo UV irradiation 4, by which the part other than the information recording region is exposed. Further, development is carried out to apply pattern formation 5 to the information recording region, which is washed with water to the full, spin-dried, and subjected to post-baking. Subsequently, An Ni-Cr alloy is sputtered onto the information recording surface to 400W700 thickness to form a dry releasing film 6, and then an Ni-plating layer 7 is formed on the above film. This plating layer 7 is stripped from a glass master 8, and the glass master 8 is sufficiently washed with water so as to be formed into a master stamper. In this way, the stamper for optical disk having high transfer accuracy and high degree of activation can be manufactured.