PURPOSE: To manufacture a thin multilayer magnetic film which has exceedingly superior magnetic characteristics and maintains these magnetic characteristics to the region of high frequency as well without performing heat treatment after forming a film by forming the film within the specified range of deposition temperature after using a reactive gas independently or in proper combination with Ar gas when the film of an insulating substance is formed.
CONSTITUTION: In manufacturing a thin multilayer magnetic film with an insulator as well as a ferromagnetic substance, first of all, the film of an amorphous metallic ferromagnetic substance is formed. Subsequently, the film of the insulator consisting of ceramics and the like is formed by sputtering on the film of the amorphous metallic ferromagnetic substance. In such a case, it is required that its ferromagnetic substance is a material which is superior in soft magnetism in the region of high frequency and then, having a high saturation magnetic flux density, a magnetostriction that becomes almost zero, and also high electric resistivity, an amorphous material is suitable for the above material. The above ceramics is obtained by using an element that forms desirable ceramics and then, a sputtering gas is manufactured by using N2 or the reactive gas of O2 independently or in proper combination with Ar gas. In this case, a temperature during deposition is controlled within a range that is not lower than 300°C and not higher than crystallization temperature of the amorphous metallic ferromagnetic substance.
JPH0798864 | PRODUCTION OF MAGNETIC RECORDING MEDIUM |
JPH11144965 | MANUFACTURE OF ELECTRONIC COMPONENT |
HAYASHIDE MITSUO
TSUGAI NORIJI
MATSUMOTO FUMIO
FUJIMORI HIROYASU
JPH01175707A | 1989-07-12 | |||
JPS5375499A | 1978-07-04 | |||
JPH0282601A | 1990-03-23 |