To provide a method for peeling off the optical thin film between substrates or configuration films by a simple process for efficiently manufacturing a thin or particular optical thin film, and to provide a manufacturing apparatus for a simple apparatus structure for the method.
A manufacturing apparatus for a thin or particular optical thin film is used. The manufacturing apparatus comprises evaporation source crucibles 33, 34, 35 of a high refractive index dielectric thin film made of a tantalum pentoxide 36, a low refractive index dielectric thin film made of a silicon dioxide 37, and a ground film for peeling made of carbon graphite 38; and a rotary substrates 32 arranged opposite to each of the evaporation sources. Then, movable shutters 41, 42, 43 for braking evaporation from an evaporation source, and a film thickness correction board 46 for correcting the film thickness of a deposition film on the rotary substrate 32, are provided. An optical thin film made of an alternate multilayer film being alternated and formed with the alternate layer of a high refractive index dielectric film and a low refractive index dielectric film as a repetition unit is formed on the substrate via a ground film for peel-off made of a carbon thin film.
NAKAMURA KYUZO
KONDO KOJI
UMEMURA SUSUMU
KAWAZU KENJI
TOYOTA MOTOR CORP
Next Patent: TRIMMING FILTER, OPTICAL SYSTEM HAVING THE SAME, AND OPTICAL DISPLAY