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Patent Searching and Data


Title:
MANUFACTURING METHOD OF BIPOLAR TRANSISTOR
Document Type and Number:
Japanese Patent JPH05144835
Kind Code:
A
Abstract:

PURPOSE: To form the title HBT(heterojunction bipolar transistor) in the state of another layer entirely removed from a base layer but capable of making an emitter approach a base electrode.

CONSTITUTION: A collector layer 2, a base layer 3, an emitter layer 4 are successively laminated on a substrate 1 and then the first resist 5 is provided on the surface of the emitter layer 4 to form an emitter 4a by etching step (a). The first resist 5 is irradiated with for ultraviolet rays to be set. Next, the whole surface is coated with the second resist 6 and then the parts of the second resist 6 on the base layer 3 are removed by photolithography. At this time, the first resist 5 is left intact. Next, a metallic layer 7 is evaporated on the surface (b) and then lifted off to form a base electrode 7a close to the emitter 4a. Finally, after exposing a collector layer 2' on the peripheral part (c), an emitter electrode 10a and a collector electrode 10b are formed.


Inventors:
YOSHIKAWA MITSUNORI
Application Number:
JP30907791A
Publication Date:
June 11, 1993
Filing Date:
November 25, 1991
Export Citation:
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Assignee:
SHARP KK
International Classes:
H01L29/205; H01L21/331; H01L29/73; H01L29/737; (IPC1-7): H01L21/331; H01L29/205; H01L29/73
Attorney, Agent or Firm:
Aoyama Ryo (1 person outside)