Title:
MANUFACTURING METHOD OF DIBENZO[G,P] CHRYSENE DERIVATIVE AND NOVEL DIBENZO[G,P] CHRYSENE DERIVATIVE
Document Type and Number:
Japanese Patent JP2021176823
Kind Code:
A
Abstract:
To provide a manufacturing method capable of selectively and simply preparing dibenzo[g, p] chrysene into which 4 hydroxyl groups are position selectively introduced with very small amount of a byproduct of an isomer, and a novel dibenzo[g, p] chrysene derivative prepared by the manufacturing method.SOLUTION: The present invention relates a method of manufacturing a dibenzo [g, p] chrysene derivative comprises steps of (1) brominating dibenzo [g, p] chrysene to synthesize 4 bromides, (2) silylating bromine atom of 4 bromides to synthesize silylated body, and (3) hydroxylate a silyl group of the silylated body by oxidation reaction to synthesize tetrahydroxy dibenzo [g, p] chrysene having a hydroxyl group at 2, 7, 10, and 15 positions. Furthermore, the present invention relates to a method of manufacturing a novel tetrahydroxy dibenzo [g, p] chrysene derivative having a hydroxyl group at 3, 6, 11 and 14 positions by dimerizing fluorenone to which an oxygen functional group is bonded.SELECTED DRAWING: None
Inventors:
IWAZAWA TETSUO
Application Number:
JP2020082081A
Publication Date:
November 11, 2021
Filing Date:
May 07, 2020
Export Citation:
Assignee:
UNIV RYUKOKU
International Classes:
C07C37/01; C07C1/207; C07C13/62; C07C17/12; C07C25/22; C07C37/055; C07C39/12; C07C41/18; C07C43/20; C07C43/225; C07C43/23; C07F7/08; C07F7/18
Attorney, Agent or Firm:
Atomi International Patent Office
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